Oxides Formed on Photocatalystic and Electronic Materials

Wednesday, October 30, 2013: 08:00-12:00
Golden Gate 2, Tower 3, Lobby Level (Hilton San Francisco Union Square)
Chair:
Dev Chidambaram
08:00
Synthesis and Electrochemical Characterizaction of TiO2 Materials
Ivan Erick Castañeda, Dr., CIICAp; Jorge Uruchurtu Uruchurtu, Dr., CIICAp
08:20
Parameters and Underlying Mechanisms Affecting the Morphology of Bifurcating TiO2 Nanotube
Darren J. LeClere, Toyohashi University of Technology; Adrian Ashari, Toyohashi University of Technology; Go Kawamura, Toyohashi University of Technology; Hiroyuki Muto, Toyohashi University of Technology; Atsunori Matsuda, Toyohashi University of Technology
09:00
TiO2-WO3 Nanotubular Composite Synthesized By Anoidzation of Simultaneous Multi-Target Sputtered Thin Films Characterized By Laser Ablation ICP-MS
York R. Smith, University of Utah; Karumbaiah N. Chappanda, University of Utah; Swomitra K. Mohanty, University of Utah; Mano Misra, University of Utah
09:20
Stability of Photoactive Oxide Semiconductors
Dev Chidambaram, Materials Science and Engineering Department, University of Nevada Reno; Ruchi Gakhar, Materials Science and Engineering Department, University of Nevada Reno
09:40
Break
10:00
Investigating Surfaces By Complimentary Chemical Spectroscopies
Gary P. Halada, Ph.D., Stony Brook University
10:40
Growth and Characterization of Tubular Oxide Layers On Ti Substrates
Hiroaki Tsuchiya, PhD, Osaka University; Shota Yamamoto, Osaka University; Shinji Fujimoto, Dr. Eng., Osaka University
11:00
Porous Anodic Oxide Films Grown On Compound Semiconductor
Sachiko Ono, PhD, Department of Applied Chemistry, Kogakuin University; Kosuke Sugawara, Graduate student, Kogakuin University; Hidetaka Asoh, PhD, Department of Applied Chemistry, Kogakuin University
 
1831
Electrical Stability Enhancement of the Thin Filmtransistor With the Back-Channel Deposited By Cosputteringamorphous In-Ga-Zn-O and Siox (Cancelled)