Simulation on the Microelectrode of Cell Electrofusion Chip
Wednesday, 8 October 2014: 11:40
Expo Center, 1st Floor, Universal 10 (Moon Palace Resort)
The process of cell electrofusion including cell alignment, cell electroporation cell electrofusion. Cell manipulation mainly related to the electric field gradient and electroporation is concerned with the intensity of the electric field. The first thing to consider in the design of Cell electrofusion chip is the control of the cell capacity , which depends on the intensity and distribution of the electric field, and this is associated with the applied voltage and the shape and distribution of the microelectrode. In the experiment, we can change the applied voltage, but the shape and distribution of the microelectrodes is hard to change. In order to improve the efficiency of the experiment, the optimum distribution and the size of the microelectrode in the chip should be determined before the experiment. Using COMSOL Multiphysics software to model and simulate the cell electrofusion chip to provide theoretical guidance for optimum chip design and experimental study late.
In this study, five different cell electrofusion chip are simulated. Using the finite element analysis method, combined with COMSOL simulation software, the electric field around the chip microelectrode is simulated and analyzed. Through the establishment of simulation model, to explore the influence on the internal electric field of the cell electrofusion chip be different parameters, including the distribution and spacing of microelectrode, , microelectrode length, width, and the size of the microstructure. Thus, best design parameters of chip microelectrode are achieved.