Control of Metal-Insulator Transition of Vanadium Dioxide Thin Film Grown by Excimer Laser Assisted Metal Organic Deposition

Monday, 6 October 2014: 15:30
Expo Center, 1st Floor, Universal 19 (Moon Palace Resort)
T. Tsuchiya, T. Nakajima, K. Shinoda, and N. Takako (National Institute of Advanced Industrial Science and Technology (AIST))

In order to fabricate the new devices for the next generation, it is necessary to develop new materials, nanostructured thin films, low temperature processing. To achieve these aims, we have developed the photo-induced chemical solution deposition such as excimer laser-assisted metal organic deposition (ELAMOD) and photo reaction of nano-particle method (PRNP) for the preparation of the patterned metal oxide thin film on organic, glass and single crystalline substrates. In this presentation, we will talk about epitaxial VO2 thin film with nanostructure by using the photo-induced chemical solution deposition, and its excellent properties of the thin film for new uncooled IR sensor.