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Studies of Metal Dichalcogenide Formation Using Electrochemical ALD
Formation of MoSe2 nanofilms by electrochemical atomic layer deposition (E-ALD) is currently being investigated by this group. E-ALD can be used to grow high quality nanofilms by alternating precursor solutions through a flow cell to deposit the desired elements up to one atomic layer at a time. Such fine control is possible by utilizing the underpotential deposition (UPD) of elements on each other. Pure Mo electrodeposition is hampered by the presence of HER, but “induced co-deposition” is possible by electrodepositing Mo in the presence of other metal ions.5 In E-ALD of MoSe2, UPD Se plays the role of this other metal ion. Electrochemical studies for growing MoSe2 by E-ALD as well as characterization of preliminary MoSe2 films will be presented.
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