1588
Invited: Novel Plasma Enhanced Chemical Vapor Deposition Methods  Utilizing Radical Reactions

Tuesday, 7 October 2014: 14:00
Expo Center, 2nd Floor, Beta Room (Moon Palace Resort)
M. Sekine (Nagoya University)
Novel plasma CVD methods with radical enhanced reactions are introduced for microcrystalline Silicon film with high rate, fuctional nano carbon and gallium nitiride film growth at lower temperature.
See more of: Thermal and Plasma CVD of Nanostructures II
See more of: N1: Thermal and Plasma CVD of Nanostructures and Their Applications
See more of: Dielectric Science and Materials
Previous Abstract | Next Abstract >>