Invited: Novel Plasma Enhanced Chemical Vapor Deposition Methods  Utilizing Radical Reactions

Tuesday, 7 October 2014: 14:00
Expo Center, 2nd Floor, Beta Room (Moon Palace Resort)
M. Sekine (Nagoya University)
Novel plasma CVD methods with radical enhanced reactions are introduced for microcrystalline Silicon film with high rate, fuctional nano carbon and gallium nitiride film growth at lower temperature.