High Resolution Characterization of Corrosion Processes II

Wednesday, 8 October 2014: 14:00-17:00
Expo Center, 1st Floor, Universal 11 (Moon Palace Resort)
Chair:
Michael Rohwerder
14:00
797
Influence of Altered Surface Layer on Corrosion Inhibition of AA5083
J. Seong, G. Frankel (Fontana Corrosion Center, The Ohio State University), and N. Sridhar (Det Norske Veritas (USA), Inc.)
14:20
798
Role of Oxide Stress in the Initiation of Pores during Anodic Oxidation of Aluminum in Acid Solutions
O. O. Capraz, P. Shrotriya, and K. Hebert (Iowa State University)
14:40
799
Investigating the Role of Electrolyte Composition and Oxide Structure in Galvanic Corrosion Susceptibility Under Atmospheric Electrolytes
S. Policastro (US Naval Research Laboratory), C. M. Hangarter (Excet, Inc.), and F. J. Martin (US Naval Research Laboratory)
15:00
800
Examination of the Electrochemical Compatibility of a Selection of Bimetallic Coins Using 3D-Skp and 3D-Svet
J. R. Searle, C. F. Glover, K. Khan (SPECIFIC, Swansea University), G. Williams, and D. A. Worsley (Swansea University)
15:20
Break
15:40
801
Effect of Inclusion Size on Pit Initiation at MnS in Stainless Steel
A. Chiba, I. Muto, Y. Sugawara, and N. Hara (Department of Materials Science, Tohoku University)
16:00
802
An Investigation of the Corrosion of Carbon Steel in Simulated Concrete Pore Water Under Anoxic Conditions
P. Lu (University of California, Berkeley) and D. D. Macdonald (University of California at Berkeley)
16:20
803
A Chemical Sensing Plate for Simultaneous Measurements of pH and Cl Concentration Inside Crevice of Stainless Steel
J. Ogawa (Department of Materials Science, Tohoku University, Fuji Heavy Industries Ltd.), I. Muto, Y. Sugawara, and N. Hara (Department of Materials Science, Tohoku University)
16:40
804
Investigating the Initial Stages of KCl-Induced Corrosion of a Chromia Stainless Steel Using ESEM in-Situ and Well-Controlled Ex-Situ Exposures at 450°c
N. Mortazavi (Chalmers University of Technology), L. Intiso (CENTRO SVILUPPO MATERIALI S.p.A.), M. Halvarsson, and L. G. Johansson (Chalmers University of Technology)