Growth of TiO2 Nanotube Layers on Ti Substrates with Different Microstructures
As-received Ti sheets (purity: 99.5%) were heat-treated at 500 °C for 12 h to ensure homogeneity. After the homogenization, some Ti sheets were heat-treated at various temperatures in argon atmosphere. Also, the other sheets were subjected to ARB (Accumulative Roll Bonding) process up to 6 cycles to change the microstructures. Anodization was carried out at 50 V for 3 h in ethylene glycol containing 2 wt% H2O and 0.05 M NH4F. After the anodization, the morphology of oxide layers was characterized by FE-SEM.
Nanotubebular oxide layers were formed on all Ti sheets whereas the growth of nanotubular oxide layer was affected by the microstructure of Ti substrate that can be controlled by heat treatment and ARB process. The grain size increased with increasing heat-treatment temperature, duration while increasing the number of ARB cycle decreased the grain size. Consequentially, nanotubular oxide layer thickness increased with decreasing grain size. Therefore, it was found that the growth behavior may be affected by the numerous lattice defects in substrate introduced by heat-treatment and ARB process.
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