Vanadium Nitride Thin Films and Nanoclusters: Growth and Electrochemical/XPS Characterization
An UHV system (SPECS) equipped with tools for XPS, e-beam assisted evaporation of metals, high pressure cell and electrochemical cell for I-V cycling was used for in-situ synthesis and characterization.
A recipe to grow VN thin films and nanoclusters via direct nitridation of thin vanadium film in atmosphere of 1 bar N2 at temperature 800 oC has been developped. Stoichiometry of the VNxOy compounds can be controoled by post oxidation of VN in oxygen atmosphere at elevated temperature. Growth of VN nanoclusters using the same procedure has been performed on HOPG surface.
Electrochemical characterization of VN and VNxOy thin films demostrated impressive areal capacitance of ~2000 µFcm-2 in 1M KOH electrolyte at scan rate 1Vs-1. XPS characterizationwas applied to elucidate electrochemical reactions occurring on the surface of VN films.
 D. Choi et al., Adv. Mater., 18, 1178 (2006)