The Electrochemical Properties of Diamond and Tetrahedral Amorphous Carbon Electrodes in Room Temperature Ionic Liquids
In this presentation, we will compare the electrochemical behavior of boron-doped nanocrystalline diamond and nitrogen-incorporated tetrahedral amorphous carbon thin-film electrodes. Specifically, contact angle measurements of the surface wettability, measurements of the double-layer capacitance (Cdl) and its variation with potential, and heterogeneous electron-transfer rate constants for redox systems in structurally distinct RTILs will be presented. These two carbon electrodes have distinct microstructures as compared to their sp2 carbon counterparts. Nitrogen-incorporated tetrahedral amorphous carbon (ta-C:N) is a composite material consisting of a mixture of sp2 and sp3-bonded carbon. Impurities can be incorporated during growth (e.g., N) further adding to their complex structure. These films typically possess 40-60% sp3-bonded carbon. It has been widely used as a protective coating due to its hardness, high wear resistance and low coefficient of friction. The growth temperature for ta-C is usually from 25 to about 100 °C. This means that non-traditional materials, such as plastics, can be used as substrates for deposition. Importantly, these carbon materials possess some electrochemical properties that are similar to those of diamond.