Semiconductor Electrochemistry - Etching, Interfaces and Devices 2

Tuesday, 26 May 2015: 14:30-17:10
Conference Room 4F (Hilton Chicago)
Chair:
Arnaud Etcheberry
14:30
1299
(Invited) Use of the Doping Dependence of Collection Efficiencies for Dye Sensitized Photocurrents to Demonstrate Physical Models for Charge Transfer at Single Crystal Oxide Semiconductor Surfaces
M. T. Spitler (U.S. Department of Energy), B. A. Parkinson, and K. Watkins (University of Wyoming)
 
1300
(Invited) Fabrication and Characterization of Silicon Microwire Anodes by Electrochemical Etching Techniques (Cancelled)
15:50
1301
Pseudocapacitive Charge Storage at Nanoscale Silicon Electrodes
W. McSweeney, H. Geaney, C. Glynn, D. McNulty, and C. O'Dwyer (University College Cork)
16:10
1302
Electroless Ni Layer: Influence of Growth Steps and Annealing Temperature on NiSi Formation
E. Delbos, H. El Belghiti (KMG Ultra Pure Chemicals, Institut Lavoisier de Versailles), D. Aureau, J. Vigneron, M. Bouttemy (Institut Lavoisier de Versailles), and A. Etcheberry (Institut Lavoisier de Versailles, UVSQ)
16:30
1303
Synthesis of Metal Oxides/Graphene Nanocomposites for Applications in Lithium-Ion Battery
J. Nan, H. Dong, G. Li, L. Yu (Qingdao University of Science and Technology), Y. Qin (Institute of Coal Chemistry, Chinese Academy of Sciences), and L. Dong (Missouri State University, Qingdao University of Science and Technology)
See more of: G02: Processes at the Semiconductor Solution Interface 6
See more of: Electronic Materials and Processing
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