1090
Epd: From Order to Chaos By the LbL Modification of the Particle Surfaces

Thursday, 2 June 2016: 11:10
Aqua 307 (Hilton San Diego Bayfront)
Z. Gonzalez (Instituto de Cerámica y Vidrio, CSIC), C. Filiatre (Institut UTINAM - UMR CNRS), Y. Castro, C. Mendoza, A. J. Sanchez-Herencia, and B. Ferrari (Instituto de Cerámica y Vidrio, CSIC)
Electrophoretic deposition (EPD) is a colloidal processing method which consists in the electrically driven movement and deposition of charged particles onto a conductive substrate. Understanding the colloidal behavior of nanoparticles is therefore mandatory to prepare stable and disperse suspensions suitable for EPD. Moreover, up today most of the proposed models for the EPD kinetics have been formulated considering the electrophoresis process. However, the effect of other parameters than electrophoresis over the kinetics, the deposition feature or the coating morphology, has been mainly empirically considered. In fact, in the well-known kinetics models based on the electrophoretic mobility of particles, these effects have been only quantified throughout the sticking factor, a probabilistic and empiric parameter.

A new perspective of the particles clustering can be extracted combining the modelling of interaction forces among particles, with the substrate coverage determined under laminar flow. In stable suspensions under similar electric conditions, changes in nature, length and ionization strength of surface modifiers determine the interaction forces among particles, resulting in an effective tool to manage particles flocculation and hence kinetics and ordering during the film growth. But also agglomerates fashioned by a Layer-by-Layer structure, built from the alternation of cationic and anionic polymers as modifiers of the particle surface, can contribute to tailor and intensify the deposition. The modification of the EPD kinetics induced by changes in the colloidal chemistry of the suspension of TiN nanoparticles and Ni(OH)2 nanoplatelets will illustrate mentioned phenomena.