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Low-Resistance Contacts for Single-Layered MoS2 n-FETs By Hydrogen Plasma

Wednesday, 1 June 2016: 17:00
Indigo 202 B (Hilton San Diego Bayfront)
A. Y. Lu (King Abdullah University of Science and Technology), C. C. Cheng (National Chiao Tung University), M. C. Chen (National Applied Research Laboratories), M. Y. Li (Research Center for Applied Sciences, Academia Sinica), M. H. Chiu (King Abdullah University of Science and Technology), C. L. Hsu (Research Center for Applied Sciences, Academia Sinica), J. K. Huang, Y. Shi, and L. J. Li (King Abdullah University of Science and Technology)
Achieving low Schottky barriers interface is important for future electronic devices based on transition metal dichalcogenides. In this study, we demonstrate that the electronic properties of single-layer molybdenum disulfide (MoS2) can be tuned from semiconducting to metallic via controlling its defect level (sulfur vacancy) by using hydrogen plasma. Raman, Photoluminescence, Atomic Force Microscopy, and X-ray photoelectron spectra suggest that the top layer sulfur in SL-MoS2 can be totally removed and stabilized in ambient environment. Field-effect transistors (FETs) with highly sulfur vacancies/Ti electrodes fabricated and exhibited high performance n-FETs. The results provide a promising route for low Schottky barrier contacts devices with graded junction interface.