Manganese oxide electrodes have been prepared by reactive magnetron sputtering from a Mn target in an Ar/O2 atmosphere as well as by anodic electrodeposition and a subsequent annealing step. Besides amorphous MnOx obtained at low temperatures, crystallized oxides, such as γ-MnO2 and α-Mn2O3, were tested as electrocatalysts. Thin (60-70 nm) and dense layers were deposited by reactive magnetron sputtering using conductive glass (FTO) slides as substrates. Cross section transmission electron micrograph (Figure 1a) clearly revealed that the sputtered α-Mn2O3 layers consist of nanocrystals of
10 - 20 nm edge length. These layers show current densities of 10 mA/cm-2 at an overpotential of 370 mV (pH 13.8). Similar overvoltages were also obtained with electrodeposited α-Mn2O3 layers (10mA/cm-2 at 340 mV overvoltage). In contrast, the electrochemically deposited α-Mn2O3 layers are several 100 nm thick and appear highly porous (Figure 1b). Obviously, the specific activity related to the active surface area of the sputtered material is about one order of magnitude higher than the one of the electrodeposited samples. Nevertheless, higher current densities can be achieved with the electrodeposited material because high electrochemically active surface areas can be provided.
This behavior will be discussed as a function of defect chemistry and will be compared with the structure – function relationship of other OER electrocatalysts.
References
[1] A. Ramírez, P. Hillebrand, D. Stellmach, M. May, P. Bogdanoff, S. Fiechter; J. Phys Chem. C, 118 (2014) 14073-14081 and SI.
[2] M.M. Najafpour, T. Ehrenberg, M. Wiechen, P. Kurz; Angew. Chem. Int. Ed., 49 (2010) 2233-2237.
Figure 1: α-Mn2O3 deposited a) by reactive magnetron sputtering and b) by electrochemical deposition.