Oxides II

Wednesday, 1 June 2016: 09:50-12:00
Aqua 310 B (Hilton San Diego Bayfront)
Chair:
Vidhya Chakrapani
09:50
Effect of Light Intensity and Wavelength on a-Ingazno Thin Film Transistors Under Negative Bias Illumination Stress
W. S. Kim, Y. H. Lee, Y. J. Cho (POSTECH), B. K. Kim, K. T. Park (LG Display), and O. Kim (POSTECH)
10:10
Mechanism of Hump Phenomenon in the I-V Characteristics of Amorphous in-Ga-Zn-O Thin Film Transistors Under Positive Bias and Illumination Stress
Y. J. Cho, Y. H. Lee, W. S. Kim (POSTECH), B. K. Kim, K. T. Park (LG Display), and O. Kim (POSTECH)
10:50
Break
11:20
Investigation on Alumina Passivation for Improved IGZO TFT Performance
T. Mudgal, N. Edwards, P. Ganesh, A. Bharadwaj (Rochester Institute of Technology), R. G. Manley (Corning Incorporated), and K. D. Hirschman (Rochester Institute of Technology)
 
1251
Ultra-Small ZnO Nanoparticles for Charge Storage in MOS-Memory Devices (Cancelled)