D. H. Lim, F. Nitze, L. Aguilera, S. Xiong, and A. Matic (Chalmers University of Technology)

A. Mastouri (Université de Picardie Jules Verne), C. Guery (University of Picardie Jules Verne), and M. Morcrette (Laboratoire de Réactivité et de Chimie des Solides)

V. P. Oleshko, A. Herzing (National Institute of Standards and Technology), K. A. Twedt (Maryland NanoCenter, University of Maryland, Center for Nanoscale Science and Technology, NIST), J. L. Schaefer (National Institute of Standards and Technology), J. J. Griebel, W. J. Chung, A. G. Simmonds, J. Pyun (University of Arizona), C. L. Soles, and J. J. McClelland (National Institute of Standards and Technology)

T. Zhang, M. Marinescu (Imperial College London), M. Wild, L. O'Neill (Oxis Energy Limited), and G. Offer (Imperial College London)

Y. Dai (Lawrence Berkeley National Laboratory), J. Y. Wang (University of California, Berkeley), G. Ai, G. Liu, and V. Srinivasan (Lawrence Berkeley National Laboratory)