Atomic Layer Deposited Tungsten-Based Coatings for Durable Solar Hydrogen Production

Sunday, 13 October 2019: 09:50
Room 215 (The Hilton Atlanta)
D. W. Palm (Stanford University), C. P. Muzzillo (National Renewable Energy Laboratory), N. Gaillard (University of Hawaii), and T. F. Jaramillo (Stanford University)
Workers in the field of solar water splitting have had success in synthesizing devices that approach the 20% solar-to-hydrogen efficiency metric required for economically feasible hydrogen production. However, these devices rely upon expensive epitaxial synthetic techniques and have not yet achieved technologically-meaningful durability metrics. The focus of this work, building upon our recent efforts (Hellstern et al, ACS Applied Energy Materials, 2019) and those of others in the field, is to enhance the hydrogen production durability of scalable copper chalcopyrite (CuGaxSey) light-absorbing materials. In this work, we have developed an atomic layer deposition (ALD) synthesis of tungsten oxide (WOx) coatings as a conformal platform for extending the durability of these already promising absorbers (Muzzillo et al, ACS Applied Materials & Interfaces, 2018). We also explore the conversion of these oxide coatings to tungsten sulfide and tungsten carbide, as electrocatalytically active protective coatings. A CuGaxSey/WOx/Pt photocathode operating under external bias (an electrode architecture that initially yielded -8 mA cm-2 of photocurrent density) continuously produced hydrogen for 6 weeks with simulated sunlight conditions in acidic electrolyte. The amount of charge passed by this device (~21,500 C cm-2) demonstrates a durability that exceeds all others reported for a polycrystalline absorber device.