Sputtering of thin electrolyte layers has been demonstrated to increase solid oxide fuel cell (SOFC) performance in very small-scale, e.g., button cells. The few cases where thin film techniques were brought in to early stages of commercialization (e.g., Lilliputian and SiEnergy) showed remarkable low temperature SOFC performance, but required sophisticated cell designs processed with Si and MEMs type technologies. This work takes advantage of low cost, conventional ceramic processing to build large format (10 cm x 10 cm) half-cells upon which the sputtered layers above are added to dramatically increase SOFC performance. In this work, an electron-blocking layer which increases the open circuit cell voltage of the GDC electrolyte based cell and a Gd doped ceria (GDC) buffer layer which mitigates reactions between the cathode and electron blocking layer are deposited by sputtering. This presentation will present progress towards developing increased SOFC performance using this sputtering technology at the commercial-scale. Challenges encountered or expected with thin film development for SOFC commercialization will be discussed.