Electrodeposition Division Early Career Investigator Award Address

Wednesday, 16 October 2019: 14:40-15:20
Room 309 (The Hilton Atlanta)
14:40
(Electrodeposition Division Early Career Investigator Award) Additives in Cu Electrodeposition for Through-Silicon Via Filling and the Growth of Cu Nanocrystals
M. J. Kim (Duke University)
See more of: E01: Current Trends in Electrodeposition - An Invited Symposium
See more of: Electrochemical/Electroless Deposition
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