848
Study of Cu, Co and Ru Nanoclusters on MoS2 to Predict Thin Film Morphology

Monday, 30 May 2022: 08:00
West Meeting Room 205 (Vancouver Convention Center)
C. L. Nies (Tyndall National Institute) and M. Nolan (University College Cork)
Interfaces of 2D materials with metals are of interest for a large variety of applications, including sensors, batteries, catalysis, electronics, and semi-conductor devices. Transition metal dichalcogenides (TMDs) and specifically MoS2 are some of the most widely studied 2D materials. A detailed understanding of the interactions of metals with 2D TMDs can give useful insights into possible applications for metal-TMD systems. However, the literature focuses mainly on comparing trends in single atom adsorption and studying nanoparticles on MoS2 monolayers.

In this work we aim to increase the understanding of metal-MoS2 interactions and metal nucleation on TMDs. We use density functional theory (DFT) to study the adsorption of small metal clusters with up to four atoms on MoS2 monolayers. Insights gained from this work allow us to understand the initial nucleation of metal thin films on TMDs as well as predict the likely morphology of the thin film as it grows.

The metals studied are Cu, Co and Ru, which are chosen for their range of applications, particularly in electronics. Metal-substrate interactions, preferred adsorption modes and stable nanocluster geometries are presented on pristine MoS2 and in the presence of the readily formed sulfur vacancy. The strength of interaction between the metals and MoS2 is in the order Co > Ru > Cu. Metal-substrate interactions are localised to the adsorption site; however we find that both Ru and Co can induce formation of sulfur vacancies through the formation of the corresponding metal sulfide.