In this work, we developed a ZIF-based thin film for dynamic cantilever gas-sensing applications. We employed a novel atmospheric pressure spatial atomic layer deposition (AP-SALD)[2][3] technique to deposit a ZnO sacrificial layer on the silicon cantilevers. This technique allows the deposition of high-quality films at atmospheric pressure, faster than conventional ALD. The ZnO layer was then converted to a particular ZIF film with desired porosity and size, through a MOF-CVD process.[4] A gas-sensing bench setup was developed for the cantilever actuation and read-out. We present the chemical and morphological properties of the ZIF, as well as the frequency response of the sensor to various gases. The device showed reliable sensitivity to humidity, CO2 and several VOCs.
References
[1] X. F. Wang, X. Z. Song, K. M. Sun, L. Cheng, and W. Ma, “MOFs-derived porous nanomaterials for gas sensing,” Polyhedron, vol. 152, pp. 155–163, 2018.
[2] D. Muñoz-Rojas, T. Maindron, A. Esteve, F. Piallat, J. C. S. Kools, and J. M. Decams, “Speeding up the unique assets of atomic layer deposition,” Mater. Today Chem., vol. 12, pp. 96–120, 2019.
[3] K. P. Musselman, C. F. Uzoma, and M. S. Miller, “Nanomanufacturing: High-Throughput, Cost-Effective Deposition of Atomic Scale Thin Films via Atmospheric Pressure Spatial Atomic Layer Deposition,” Chem. Mater., vol. 28, no. 23, pp. 8443–8452, 2016.
[4] I. Stassen et al., “Chemical vapour deposition of zeolitic imidazolate framework thin films,” Nat. Mater., vol. 15, no. 3, pp. 304–310, 2016.