A key aspect plaguing the PEMWEs is the highly oxidative and corrosive environment that is typically observed on the anode side. This significantly affects the interfacial contact resistance (ICR) of the components as the corrosion can cause the ohmic resistance of the PTL to increase. In order to combat the corrosion in the PTLs, in this work we use two thin film deposition methods, Physical Vapor Deposition (PVD) and Vacuum Sputtering, to deposit protective metal layers on top of the state-of-the-art Ti PTLs [2]. The explored metal coatings of interest are Platinum (Pt) and Gold (Au) [9]. For the purposes of these experiments, Au and Pt coatings with various thicknesses are deposited on Ti-PTLs by using either PVD or vacuum spattering method. As deposited thin films are characterized by scanning electron microscopy (SEM), digital optical microscopy, and inductively coupled plasma (ICP) analysis. Also, the in-plane conductivity and the ICR of all samples of interest are measured before and after the electrochemical tests by using the 4-probe method and in-house build setup for ICR measurements. The optimal deposition parameters for fabrication of thin, continuous and smooth Pt and Au protective coatings that result in minimum ICR and improved in-plane conductivity of the PTLs of interest are identified, and the results will be reported at the ECS 241 meeting.
References:
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