Over the last few decades, a tremendous research effort has been dedicated to realizing colloidal nanocrystals (NCs) as useful devices. Contrary to the well-established synthesis of colloidal NCs, the fabrication method to transfer the NCs to a nanostructured film has not studied well, despite the importance of using NCs as integrated devices. Especially, an advanced fabrication technique is crucial for further improving device performance along with the fine colloidal synthesis and NC device applications. As an advanced technique, electrophoretic deposition (EPD) can be introduced to mitigate the limitations of traditional tools, such as spin-coating, drop-casting, and spray coating, by creating desirable NC thin films from colloidal solutions using an electric field. We found several key controllable parameters such as solvent, surfactant ligand, and voltage, to tune the NC film’s morphology as well as the mechanism of the NC deposition. To clearly understand the mechanism of the deposition, in-situ technique was also developed by utilizing a light scattering method, which can provide the real time tracking analysis.