In this work, block copolymer (BCP) was used to prepare hexagonally packed cylinder nano-template as an oxidation mask for UV/ozone treatment, which resulted in numerous nanoscale homojunctions on WSe2. To fabricate the mask with hexagonally packed cylinders, asymmetric poly (styrene-block-methyl methacrylate) (PS-b-PMMA) was spin-coated. After thermal annealing for self-assembly, PMMA was selectively removed by reactive ion etching. UV/ozone treatment, one of the oxidation methods of the WSe2, leads to the formation of the the tungsten oxide (WOX) with high electron affinity and induces a p-doping effect. By using BCP as an oxidation mask, the only region of the WSe2 under the removed PMMA blocks could be converted into WOX.
The responsivity of the nano-pattern oxidized WSe2 phototransistor manifests a dramatic change depending on the applied gate bias. The device exhibited a responsivity (532 nm, 8.515 mW/cm2) of 27.5 mA/W under applied gate bias of 0 V. However, under the gate bias of +60 V, the device showed an enhanced responsivity of 155.2 mA/W, as strong p-n junctions were induced. In conclusion, the nano-pattern oxidized WSe2 phototransistor presents increased responsivity (155.2 mA/W), external quantum efficiency (36.3%) and faster response time than the pristine WSe2.
This work demonstrates that the responsivity of the WSe2 phototransistor can be improved though well-established perpendicular BCP and optimized by effective modulation of gate bias. By implementing homojunctions on the WSe2 via the nano-pattern oxidation method, this work greatly expands the potential applications of 2D TMDs materials for next-generation nanoscale optoelectronic devices.