In this presentation, we describe a series of Density Functional Theory (DFT) calculations to rigorously describe thermodynamically the structure of various LMO surface terminations. Although certain low-index LMO surface structures has been investigated previously,3–5 additional low energy surface structures have been identified through the application of a grand canonical thermodynamic formalism to describe the stability of off-stoichiometric surfaces. Moreover, several stable high-index surface structures have also been identified, which may be representative of edges or defects on LMO particles.
The stable surface structures identified for LMO are next used as model substrates to understand the formation of ultrathin films via atomic layer deposition (ALD). We describe, in particular, the formation of Al2O3films by ALD through alternating trimethylalumina (TMA) and water half-cycle exposures. DFT calculations are used to determine the thermodynamics and kinetics of TMA decomposition on the (001) and (111) surfaces of LMO. Based on calculated demethylation thermodynamics and kinetics, we demonstrate that TMA is likely to lose all methyl groups in the first half-cycle, which are coadsorbed through oxygen on the LMO surface. We further describe how model defects impact the initial ALD deposition mechanisms, and we thereby draw general conclusions concerning the growth of ultrathin alumina films on LMO nanoparticles. More generally, determining the structure of the first monolayer of these protective films is an important step towards gaining a detailed understanding of the enhanced performance of coated electrodes. Such atomistic insights can assist in providing predictions for optimal film chemistries to suppress transition metal dissolution from the cathode surface.
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