Abstract: Mimization of Incubation Layer in Nanocrystalline Silicon Films Prepared by Catalytic CVD At 100 °C (223rd ECS Meeting (May 12-17, 2013))

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Mimization of Incubation Layer in Nanocrystalline Silicon Films Prepared by Catalytic CVD At 100 °C

Tuesday, May 14, 2013

Osgoode Ballroom, Lower Concourse Level (Sheraton)

Tae-Ho Song , University of Seoul, Seoul, South Korea

Wan-Shick Hong , University of Seoul, Seoul, South Korea

Abstract:

A1-0038 (1609.9KB) - Abstract Text