Morning Session

Wednesday, May 15, 2013: 08:00-12:00
Windsor West, Mezzanine Level (Sheraton)
Chairs:
Luca Magagnin and Elizabeth J. Podlaha-Murphy
08:00
983
(Invited) Influence of Current and Potential Distributions on The Impedance Response of a Rotating Disk Electrode
Mark E. Orazem, PhD, University of Florida; Vincent Vivier, PhD, LISE, UPR 15 du CNRS; Bernard Tribollet, PHD, LISE, UPR 15 du CNRS
08:40
984
An Electrochemical Cell with Improved Flow for Uniform Current Distribution and Plating Thickness
Holly Garich, Faraday Technology, Inc.; E. J. Taylor, Faraday Technology Inc.
09:00
985
Pulsed Electrodeposition of Iron Oxide Nanoparticles for Catalytic and Advanced Electrode Materials Applications
Sofía Pérez-Villar, CIC Energigune; Javier Carretero-Gonzalez, CIC Energigune; Carmen M. Lopez, CIC Energigune
09:20
986
Pulse Electrodeposition of Multi-Segmented Super Invar/Au Nanowires
Hana Kim, Northeastern University; Steven A. Soper, University of North Carolina; Elizabeth J. Podlaha-Murphy, Northeastern University
09:40
Break
10:00
987
Electrodeposition and Electroless Deposition of NiWP Alloys
Stojan Djokic, Elchem Consulting, Ltd.
10:20
988
Pulse Electrodeposition of NiMoW Alloys
Shaopeng Sun, Northeastern University; Elizabeth J. Podlaha, PhD, Northeastern University
10:40
989
Electrodeposited Nickel- and Nickel-Tungsten-CNT Composite Coatings
Sven Hartwig, Institut für Oberflächentechnik, TU Braunschweig; Claus-Peter Klages, Institut für Oberflächentechnik, TU Braunschweig
11:00
990
Electrodeposition of Zinc Nanoparticles in Anodic Aluminium Oxide from Ionic Liquids
Maksim Starykevich, Master, University of Aveiro, Portugal; Yulia Nazarkina, Master, Faculty of Electronic Technologies, Materials and Equipment, National Research University of Electronic Technology, Zelenograd, Moscow, Russia; Aleksey Lisenkov, Master, University of Aveiro, Portugal; Mikhail Zheludkevich, Ph.D., University of Aveiro, Portugal; Mario Ferreira, Ph.D., University of Aveiro, Portugal
11:20
991
Electrodeposition in Ionic Liquids of Metal Oxides for Electrochemical Systems
Michal Tulodziecki, Laboratoire de Réactivité et Chimie des Solides, CNRS UMR6007, UPJV; Jean-Marie Tarascon, Laboratoire de Réactivité et Chimie des Solides, CNRS UMR 7314, Université de Picardie Jules Verne; Pierre-Louis Taberna, Université Paul Sabatier; Claude Guery, Laboratoire de Réactivité et Chimie des Solides, CNRS UMR6007, UPJV
11:40
992
Electrochemical Formation of RE-Cu (RE=Dy, Nd) Alloys in a Molten LiCl-KCl System
Hirokazu Konishi, Ph.D., Osaka University; Hideki Ono, Osaka University; Eiichi Takeuchi, Osaka University; Toshiyuki Nohira, Kyoto University; Tetsuo Oishi, National Institute of Advanced Industrial Science and Technology
See more of: F2: Novel Design and Electrodeposition Modalities
See more of: Electrochemical/Chemical Deposition and Etching
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