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Formation of a Bilayer of Low-Temperature CVD-SiO2 and Sputtered Al2O3 Films On Polyethylene Terephthalate Substrates for OLED Encapsulation Layer
Formation of a Bilayer of Low-Temperature CVD-SiO2 and Sputtered Al2O3 Films On Polyethylene Terephthalate Substrates for OLED Encapsulation Layer
Tuesday, October 29, 2013
Grand Ballroom, Tower 2, Grand Ballroom Level (Hilton San Francisco Union Square)
Abstract:
- A1-0059 (166.1KB) - Abstract Text