2368
Electroless Deposition On Self-Assembled Monolayers As a Method to Enable Fabrication of Advanced Interconnects

Monday, October 28, 2013: 09:20
Union Square 23/24, Tower 3, 4th Floor (Hilton San Francisco Union Square)
Aranzazu Maestre Caro , Intel corporation, Hillsboro, OR
Ramanan Chebiam , Intel corporation
Lieve Teugels , Imec
Scott Clendenning, PhD , Intel Corporation
James Clarke , Intel corporation

Abstract:

See more of: Novel Nano-fabrication Methods 1
See more of: F5: Emerging Opportunities in Electrochemical Deposition for Nanofabrication
See more of: Electrochemical/Chemical Deposition and Etching
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