Novel Nano-materials via Electrochemical Routes

Tuesday, October 29, 2013: 14:00-17:50
Union Square 23/24, Tower 3, 4th Floor (Hilton San Francisco Union Square)
Chairs:
Rohan Akolkar and Mark Anderson
14:30
Electrochemical Fabrication of Magnetic Nanostructures- Analysis, Control, and Design of Deposition Processes -
Takayuki Homma, Ph.D, Waseda University; Siggi Wodarz, Waseda University; Bin Jiang, Waseda University; Masahiro Kunimoto, Waseda University; Masahiro Yanagisawa, Professor, Nanotechnology Laboratory, Waseda University
15:00
Adhesion of Electroless Nib Film On Modified Polyimide With Aminosilane
Tetsuya Osaka, Faculty of Science and Engineering, Waseda University; Shumpei Matsui, Faculty of Science and Engineering, Waseda University; Kazuya Tadokoro, M2, Faculty of Science and Engineering, Waseda University; Takuma Hachisu, Institute for Nanoscience and Nanotechnology, Waseda University; Atsushi Sugiyama, Institute for Nanoscience and Nanotechnology, Waseda University; Itsuaki Matsuda, Faculty of Science and Engineering, Waseda University; Tokihiko Yokoshima, Faculty of Science and Engineering, Waseda University
15:30
Electrochemical Processing of Carbon Nanostructures
Philippe M. Vereecken, imec, Belgium; Aleksandar Radisic, PhD, imec Belgium; Daire J Cott, PhD, imec
16:00
Near-Surface Atomic and Electronic Structural Effects in Layer-By-Layer Derived Core-Shell Catalysts
Faisal M Alamgir, Ph.D., School of Materials Science and Engineering, Georgia Institute of Technology
16:30
Superconformal Deposition of Au in a Sulfite Electrolyte
Daniel Josell, NIST; Thomas P. Moffat, NIST
16:50
Electrodeposition of Cobalt-Tungsten Alloys From An Alkaline Citrate-Containing Bath As Barrier Layers in Electronic Application
Nazila dadvand, Dalhousie University; G jarjoura, Dalhousie University; G. J. kipouros, Dalhousie University
17:10
Cu Electroless Deposition By Using Cu Nanoparticles As Catalysts for a Printed Circuit Board Metallization
Yi-Chun Chung, Master, Department of Chemical Engineering; Wei-Ping Dow, National Chung Hsing University
17:30
Electroless Co-B-P-W Deposition Using Dmab As  reducing Agent
Eugenijus Norkus, PhD, Center for Physical Sciences and Technology; Aldona Jagminiene, Center for Physical Sciences and Technology; Ina Stankeviciene, Center for Physical Sciences and Technology; Loreta Tamasauskaite-Tamasiunaite, Center for Physical Sciences and Technology; Zita Sukackiene, Center for Physical Sciences and Technology