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Electrodeposition of Cobalt-Manganese Alloy Coatings for Surface Modification of Metallic SOFC Interconnects
In this work, a pulse electrodeposition process is being developed and validated for coating metallic SOFC interconnects with a cobalt-manganese alloy. A single acidic sulfate based electrolyte containing cobalt and manganese ions, sodium gluconate, ammonium sulfate and boric acid is used to electrodeposit the alloy coatings. The pulse electrodeposition process has been scaled from 5 cm2 laboratory scale button cells to 115 cm2industrial scale metallic interconnects containing gas flow field features. The alloy composition is influenced and can be controlled by the electrodeposition parameters to tune the spinel composition. Long term exposure at elevated temperatures has shown that the coatings function as a barrier to chrome diffusion toward the surface with minimal increase in the area specific resistance (ASR) suggesting a well-adhered chromia scale. Long term on-cell performance tests using coated button cells displayed minimal voltage decay, indicating cell stability (Figure 1). Coating composition as a function of electrodeposition parameters, as well as performance data from short-stack testing will be presented.
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