SURMOFs as Ultra-low k Dielectric Thin Films

Wednesday, 8 October 2014
Expo Center, 1st Floor, Center and Right Foyers (Moon Palace Resort)


Here we present a particularly interesting class of surface-anchored (metal-organic frameworks) materials SURMOFs for the fabrication low-k dielectric thin films.

Since these materials are highly porous and the size of their pores are highly adjustable, they can be further functionalized (e.g. with different metal/oxo connectors or clusters linked with various organic linkers) e.g. in order to specifically bind target analytes (optical sensing), to electrically load and unload small ions (optoelectronic applications) inside the metal-organic pores.

In addition, the RI (Refractive Index) as well as the optical properties of SURMOF-materials can be tailored, e.g. through their organic linkers – a fact which makes these materials ideally suited for photonic, optical and low-k dielectric applications.