Thermal and Plasma CVD of Nanostructures III Poster Session

Tuesday, 7 October 2014: 18:00-20:00
Expo Center, 1st Floor, Center and Right Foyers (Moon Palace Resort)
High Quality Inductively Coupled Plasma Chemical Vapor Deposited SiOxNy Gas Barrier Films for OLED Display
S. H. Bang, J. H. Suk, D. Choi, K. Kim, and N. M. Hwang (Seoul National University)
Characterization of Tinbcn Coatings Subject to Micro-Abrasion Wear and Corrosion Phenomena in a Simulated Biological Fluid
J. L. Caballero, W. A. Aperador Chaparro, and J. Duque (Universidad Militar Nueva Granada)