Thermal and Plasma CVD of Nanostructures III Poster Session

Tuesday, 7 October 2014: 18:00-20:00
Expo Center, 1st Floor, Center and Right Foyers (Moon Palace Resort)
1594
High Quality Inductively Coupled Plasma Chemical Vapor Deposited SiOxNy Gas Barrier Films for OLED Display
S. H. Bang, J. H. Suk, D. Choi, K. Kim, and N. M. Hwang (Seoul National University)
1595
Characterization of Tinbcn Coatings Subject to Micro-Abrasion Wear and Corrosion Phenomena in a Simulated Biological Fluid
J. L. Caballero, W. A. Aperador Chaparro, and J. Duque (Universidad Militar Nueva Granada)
1596
Dependence of Spatial Uniformity of Nanocrystalline Silicon and Silicon Nitride Films on the Thermal Profile of Low Temperature Catalytic CVD Reactor
T. H. Song, S. M. Noh, and W. S. Hong (University of Seoul)
See more of: N1: Thermal and Plasma CVD of Nanostructures and Their Applications
See more of: Dielectric Science and Materials
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