Wet Metallization II
Wet Metallization II
Monday, 25 May 2015: 10:00-14:00
PDR 5 (Hilton Chicago)
Chairs:
Paula Cojocaru
,
Yosi Shacham-Diamand
and
Giovanni Zangari
10:00
1137
Direct Copper Electroplating on Polyimide Film By Using Ni As Barrier and Conductive Interlayer (Cancelled)
11:40
See more of: E01: Metallization of Flexible Electronics
See more of: Electrochemical/Electroless Deposition
See more of: Electrochemical/Electroless Deposition