Dielectric Science and Technology Division Thomas D. Callinan Award

Wednesday, 27 May 2015: 08:45-09:30
PDR 7 (Hilton Chicago)
08:45
(Dielectric Science & Technology Division Thomas D. Callinan Award)  Boron Carbon Nitride Thin Films  for Low-k Dielectric Interconnect and Optical Applications
K. B. Sundaram, A. Prakash (University of Central Florida), and S. W. King (Intel Corporation)
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