Reduction of Graphene Oxide through Intense Pulsed Light Towards Transparent Conductive Coating Applications

This work studies the capabilities and conditions for reduction of solution processed graphene oxide films through an Intense Pulse Light process towards flexible and additive deposition of transparent conductive coatings.  The film deposition and reduction processes occurred at room temperature without need for any vacuum processing.  The reduction for the graphene oxide is explored at different energy densities and the reduced graphene oxide’s conductivity displayed an increasing trend with increased Intense Pulsed Light processing.  Characterization techniques of Raman spectroscopy, UV-Visible spectroscopy, X-Ray Diffraction, and the four point probe method were employed for analysis.  Through the Intense Pulsed Light process, the characteristic Raman peak of graphene (2D) emerged.  When compared to the graphite (G) peak, the 2D/G ratio showed a general trend of increasing with higher energy inputs, going from 1.06 at 256 Jcm^-2 and 1.76 at 1723 Jcm^-2.  The defects (D peak) to G peak ratio, D/G, displayed a decreasing trend with increasing energy input going from 1 to .89 at 256 Jcm^-2 and .38 at 1723 Jcm^-2, suggesting that the Intense Pulsed Light process “heals” the films, in addition to the reduction.