In this study we investigated the impact of SPA plasma oxidation (SPAO) treatment in improving the interface quality when MOS capacitors were fabricated on 300mm p-type Ge substrates. SPAO plasma treatments were performed at different steps in the high-k deposition process. The substrate was initially subjected to a dry chemical oxide removal (COR) process. Subsequently, three different sets of samples were prepared with the exposure of SPAO plasma at following locations (Fig.1): CASE-1: SPAO plasma treatment after Al2O3(1nm)/ZrO2(3.5nm) deposition; CASE-2: SPAO plasma treatment was carried out in between Al2O3(1nm) and ZrO2(3.5nm) deposition; CASE-3: the Ge substrate was exposed to SPAO plasma treatment after COR and prior to Al2O3(1nm)/ ZrO2(3.5nm) layer deposition. Al2O3(1nm) and ZrO2(3.5nm) layers were deposited by atomic layer deposition. Capacitance-voltage at multi-frequencies,current-voltage and conductance measurements were performed at room temperature. Parameters like flatband voltage (Vfb), equivalent oxide thickness(EOT), interface state density(Dit),and leakage current were estimated accurately after quantum mechanical corrections and eliminating the series resistance effect.
As shown in Fig. 2 lowest fast interface state density is achieved when SPAO plasma treatment was performed after Al2O3 and prior to ZrO2 deposition (CASE-2). A comparable Dit is also observed when plasma exposure was done after the entire gate stack deposition (CASE-1) (Fig.2). From different experimental results significant degradation to both the dielectric quality and interface was observed when SPAO is performed just after COR (CASE-3).
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