In this study, the effect of type of gases used in pyrolysis on the physical and electrochemical characteristic on SU-8 photoresist derived carbon film fabricated on silicon wafer was been investigated. Pyrolysis process was performed in the presence of nitrogen, argon and helium gas, repectively in temperature of 1100 °C in furnace. Thermogravimetric analysis, Raman spectroscopy, X-ray diffraction, scanning electron microscopy and energy-dispersive X-ray spectroscopy techniques were used to charcterise the surface structure of fabricated carbon film. The electrochemical properties of the SU-8 fabricated thin film was analysed with cyclic voltammetry and electrochemical impedance spectroscopy. The results were then correlated with type of gases in pyrolysis process.

Acknowledgement

This research is supported by University Malaya Flagship Grant project FL001A-14AET, and Transdisciplinary Research Grant Scheme (TRGS TR002A-2014) from Malaysian Ministry of Higher Education, and MOSTI SF020-2014.