Plasma and Thermal Processes for Materials Modification, Synthesis and Processing 3

Tuesday, 31 May 2016: 14:00-16:15
Aqua 309 (Hilton San Diego Bayfront)
Chairs:
Manfred Engelhardt , O. M Leonte and Dennis W Hess
 
1074
(Invited) Impact of Spark Plasma Sintering on the Thermoelectric Properties of Advanced Nanostructured Materials for Waste Heat Recovery (Cancelled)
15:00
Break
15:15
Plasma Etching Chemistry for Smoothening Ofultrananocrystalline Diamond Films
M. K. Sunkara (Conn Center for Renewable Energy Research), D. F. Jaramillo-Cabanzo, and G. Willing (University of Louisville)
15:35
Environmental-Friendly Fluorine Mixture  for CVD Cleaning Processes to Replace C2F6, CF4 and NF3
R. Wieland (Fraunhofer EMFT), M. Pittroff (Solvay Fluor GmbH), J. Boudaden, S. Altmannshofer, and C. Kutter (Fraunhofer EMFT)
 
1078
Proton Inserted SiO2 Dielectrics for Nonvolatile Memory-Thin Film Transistor (Cancelled)