C. Wolverton (Northwestern University)

Z. Zhu, I. H. Chu, Z. Deng, and S. P. Ong (University of California, San Diego)

P. Notten, D. Li, D. Danilov (Eindhoven University of Technology), and Y. Yang (Xiamen University)

A. Kumar (Oak Ridge National Lab), S. Allu, S. Kalnaus, D. Lebrun-Grandie, S. Simunovic, J. A. Turner, and H. Wang (Oak Ridge National Laboratory)

C. L. Cobb (PARC, A Xerox Company)

L. Li, A. Kinaci, and M. K. Y. Chan (Argonne National Laboratory)

D. M. Cupid, D. Li, T. L. Reichmann (Karlsruhe Institute of Technology, IAM-AWP), S. Fuertauer, A. Beutl (University of Vienna, Inorg.Chemistry-Mater. Chemistry), H. J. Seifert (Karlsruhe Institute of Technology, IAM-AWP), and H. Flandorfer (University of Vienna, Inorg.Chemistry-Mater. Chemistry)

I. H. Chu, H. Nguyen (University of California, San Diego), Y. C. Lin (NECCES at Univeristy of California, San Diego), Z. Wang, Z. Xu, S. Hy, Z. Deng (University of California, San Diego), S. Y. Meng (NECCES at University of California, San Diego), and S. P. Ong (University of California, San Diego)

H. Yuan (University of California, Irvine) and Y. Wang (UCI)

Y. Wang (UCI)