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Black Phosphorus p-Doping By Integration of MoS2 Nanoparticles

Tuesday, 15 May 2018: 16:20
Room 201 (Washington State Convention Center)
S. Jeon (SAINT, Sungkyunkwan University(SKKU)), M. Kim, J. Jia (SAINT, Sungkyunkwan University (SKKU)), J. H. Park (Sungkyunkwan University), Y. J. Song (SAINT, Sungkyunkwan university (SKKU)), and S. Lee (SAINT, Sungkyunkwan University (SKKU))
A new doping method of BP by integration of density-controlled monolayer MoS2 nanoparticles (NPs) is demonstrated. MoS2 NPs with different density were synthesized by chemical vapor deposition (CVD) and transferred onto a few-layer BP channel, which induced a p-doping effect. The hole concentration of BP was controlled with different densities of MoS2 NPs in a range of 1012 - 1013 cm-2. The doping mechanism was explained by a charge transfer by work function differences between BP and MoS2 NPs, which was confirmed by Kelvin probe force microscopy (KPFM) and electrical measurements. Raman and X-ray photoelectron spectroscopy (XPS) were measured to confirm the oxidation on the edge of MoS2 NPs and a doping effect of MoS2 NPs on a BP channel. This result shows promising possibility for BP device functionalization by decorating various NPs, which will enhance the device performance such as photoresponsivity, or chemical sensitivity.