However, further improvements in resolution are required to fabricate advanced porous materials with localized properties for various applications [4]. Pursuant to this goal, simulations can be used, in tandem with experiments, to elucidate the dominating parameters that influence the resolution (e.g. electron energy, mask-to-sample separation). Moreover, simulations can be utilized in a predictive fashion to calculate the electron beam parameters required to fabricate a given material. In this presentation, we will discuss the influence of electron beam energy on the spatial resolution of porous materials typically used in PEFCs. A combination of experiments and Monte-Carlo simulations was employed to advance the fundamental understanding of mask-assisted through-volume modifications of thick porous substrates. Interestingly, we found that an energy of, at least, 140 keV was required to modify throughout the complete thickness and that the use of energies lower than 300 keV results in a blurring in the adjacent regions. Additionally, we will discuss the influence of housing materials on the back-scattered radiation. Finally, and due to its practical relevance, we will discuss the possibility of selectively modifying one layer out of a bi-layered material (i.e. GDL-MPL arrangement).
[1] Forner-Cuenca, A. et al., Adv. Mater. 27, 6317–6322 (2015).
[2] Forner-Cuenca, A. et al., J. Electrochem. Soc. 163, F1038–F1048 (2016).
[3] Forner-Cuenca, A. et al., J. Electrochem. Soc. 163, F1389–F1398 (2016).
[4] Forner Cuenca, A. et al., Radiat. Phys. Chem. 135, 133–141 (2017).
Acknowledgments
AFC gratefully acknowledges the financial support of the Swiss National Science Foundation (P2EZP2_172183).