The advantage of Si qubits is that matured CMOS technologies can be applied for integration of qubits. At Tokyo Tech, we have studied physically-defined coupled QDs in MOS structures prepared on Si-on-insulator (SOI) substrates [9-20], which are promising for high density integration. The physically-defined devices do not require gates to create confinement potentials for the QDs. These devices thus represent a technological simplification owing to the reduced number of gates. Common fabrication processes normally used to produce Si MOS was applied to make the physically-defined Si QDs.
We have developed various device structures of physically-defined Si QDs. By measuring double QD devices, we succeeded in charge sensing of few-electron regime [11, 15, 16] and observation of Pauli-spin blockade [12]. In triple QDs arranged in an equilateral triangle, we demonstrated for the first time in the world a silicon-based two-dimensional arrayed QD structure [20]. We also fabricated and characterized Si double QDs in p-channel MOS and few-hole regime and Pauli-spin blockade were observed [14, 18, 19]. Furthermore, we formed Si single QDs on ultrathin (~6 nm) SOI and obtained comparatively large charging energy (~ 20 meV). We performed three-dimensional calculations of capacitance matrix and transport properties through the QD and found a good quantitative agreement with experiment [17]. These achievements are the important steps for realizing quantum computation devices.
We have also studied gate-defined QDs in Si/SiGe heterostructures to demonstrate high-fidelity gate operation through joint research with the University of Tokyo [3,6,7]. The fusion of Si devices and established GaAs qubit technology was advanced. Manipulation of spin states in Si QDs and single-shot readout using a measurement system constructed through development of GaAs qubits, demonstrating that the coherence time is about 100 times longer than that of GaAs systems [3]. The fidelity of single-qubit gate operation has been demonstrated to be 99.6% for native Si QDs [3] and 99.93% for isotopically-engineered Si QDs [6]. Both fidelity values are above the quantum error correction threshold of 99%.
This work was financially supported by Q-LEAP of the Ministry of Education, Culture, Sports, Science and Technology (MEXT) and CREST (JPMJCR1675) of Japan Science and Technology Agency (JST) in Japan.
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