E03 - Electrodeposition in Ionic Liquids III

Tuesday, 15 October 2019: 14:00-16:40
Room 310 (The Hilton Atlanta)
Chairs:
Adriana Ispas and Tetsuya Tsuda
14:00
Influence of the Substrate on the Electrodeposition of Silicon from Ionic Liquids
S. Link, S. Ivanov, A. Dimitrova, S. Krischok, and A. Bund (Technische Universität Ilmenau)
14:20
(Invited) Electrochemical Preparation of Pd Nanoparticles in Different Ionic Liquids
Y. Katayama, K. Masuda, N. Tachikawa, and N. Serizawa (Keio University)
15:00
Investigation on Parameters Influencing the Electrodeposition of Niobium-Based Layers
A. Endrikat, A. Ispas, and A. Bund (Technische Universität Ilmenau)
15:20
Electrochemical Deposition of Tantalum from Ionic Liquids
T. Engemann, A. Ispas (Technische Universität Ilmenau), N. Borisenko (Clausthal University of Technology), L. Frankemoelle, J. Becker (Imperial College), A. Bund (Technische Universität Ilmenau), and P. A. Hunt (Imperial College)
15:40
Break
16:00
Electrodeposition of Al–W Alloy Films Using W(II) Salts Synthesized Using Different Methods
S. Higashino, M. Miyake, T. Ikenoue, and T. Hirato (Kyoto University)
16:20
Noble Metals Alloys Deposition from Non-Aqueous Solvents
M. Manolova and R. Böck (fem)
See more of: E03: Ionic Liquids as Reactive Media for Electrodeposition Processes
See more of: Electrochemical/Electroless Deposition
<< Previous Session | Next Session >>