In this work, a thin film of nickel oxide (NiO) is deposited with RF magnetron sputtering technique on quartz, glass and indium tin oxide (ITO) substrates in pure argon atmosphere respectively. The thin films are characterized by Ultraviolet-visible spectroscopy (Uv-Vis), Scanning Electron Microscopy (SEM), Energy Dispersive X-ray spectroscopy (EDX), X-Ray Diffraction (XRD) analysis and 4-probe resistivity measurements. Typical UV-Vis and X-ray diffraction patterns (Fig. 1a-b) show that thin film NiO are successfully fabricated on these substrates. It can be seen from Figure 1b that increase in temperature significantly increases the material crystallinity, with some peaks becoming clearly more visible. From Table 1 we can deduct that the increase in power increase oxygen in the compound. The electrical properties are to be measured at probe stations for low temperatures (5K) up to room temperature. In summary, the phase transition of thin film NiO as well as light absorption from 220 to 850 nm have been investigated on these substrates.
References
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