783
(Invited) High Sensitivity Optical Characterization of Thin Films with Embedded Si Nanocrystals

Monday, May 13, 2013: 11:20
Conference Room F, Mezzanine Level (Sheraton)
Peter Petrik, PhD , Institute for Technical Physics and Materials Science (MFA), Budapest, Hungary
Emil Agocs , Institute for Technical Physics and Materials Science (MFA)

Abstract:

See more of: Fabrication and Characterization I
See more of: E3: Nanocrystal Embedded Dielectrics for Electronic and Photonic Devices
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
<< Previous Abstract | Next Abstract