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Tensor Evaluation of Stress Relaxation Profile in Strained SiGe Nanostructures on Si Substrate
Tensor Evaluation of Stress Relaxation Profile in Strained SiGe Nanostructures on Si Substrate
Tuesday, May 14, 2013: 09:00
Provincial Ballroom North, Second Floor (Sheraton)
Abstract:
- E2-0744 (168.9KB) - Abstract Text