Germanium Nanostructures and Devices
Tuesday, May 14, 2013: 08:30-12:10
Provincial Ballroom North, Second Floor (Sheraton)
Chairs:
Geert Eneman
and
David J. Lockwood
08:30
(Invited) Photoluminescence Efficiency of Germanium Dots Self-Assembled on Oxides
David J. Lockwood, National Research Council Canada;
Nelson L. Rowell, National Research Council Canada;
Eric G. Barbagiovanni, Western University;
Lyudmila V. Goncharova, Western University;
Peter J. Simpson, Western University;
Isabelle Berbezier, Institut Matériaux Microélectronique Nanosciences de Provence;
Guillaume Amiard, Institut Matériaux Microélectronique Nanosciences de Provence;
Luc Favre, Institut Matériaux Microélectronique Nanosciences de Provence;
Antoine Ronda, Institut Matériaux Microélectronique Nanosciences de Provence;
Marco Faustini, Collège de France;
David Grosso, Collège de France
10:10
(Invited) Stress Simulations of Si- and Ge-Channel FinFETs for the 14 nm-Node and Beyond
Geert Eneman, imec;
David P. Brunco, imec;
Liesbeth Witters, imec;
Benjamin Vincent, imec;
Paola Favia, imec;
Andriy Hikavyy, imec;
An De Keersgieter, imec;
Jerome Mitard, imec;
Roger Loo, imec;
Anabela Veloso, Imec;
Olivier Richard, imec;
Hugo Bender, imec;
Wilfried Vandervorst, imec;
Matty Caymax, imec;
Naoto Horiguchi, Imec;
Nadine Collaert, PhD, imec;
Aaron Thean, imec
10:40
(Invited) Germanium Nanostructures in High-K Materials
Peter Seidel, Institut für Angewandte Physik, TU Bergakademie Freiberg, 09599 Freiberg, Germany;
Maximilian Geyer, Institut für Angewandte Physik, TU Bergakademie Freiberg, 09599 Freiberg, Germany;
David Lehninger, Institut für Angewandte Physik, TU Bergakademie Freiberg, 09599 Freiberg, Germany;
Frank Schneider, Institut für Angewandte Physik, TU Bergakademie Freiberg, 09599 Freiberg, Germany;
Volker Klemm, Institut für Werkstoffwissenschaften, TU Bergakademie Freiberg, 09599 Freiberg, Germany;
Johannes Heitmann, Institut für Angewandte Physik, TU Bergakademie Freiberg, 09599 Freiberg, Germany
11:10
GeSn Film Deposition Using Metal Organic Chemical Vapor Deposition
Kohei Suda, Meiji University;
Tomohiro Uno, Meiji University;
Tatsuya Miyakawa, Meiji University;
Hideaki Machida, Gas-phase Growth Ltd.;
Masato Ishikawa, Gas-phase Growth Ltd.;
Hiroshi Sudo, Gas-phase Growth Ltd.;
Yoshio Ohshita, Toyota Technological Institute;
Atsushi Ogura, Meiji University
11:30
Identification of Deep Levels Associated with Extended and Point Defects in GeSn Epitaxial Layers Using DLTs
Somya Gupta, IMEC, Belgium;
Eddy Simoen, IMEC, Belgium;
Henk Vrielinck, University of Gent, Belgium;
Clement Merckling, IMEC, Belgium;
Benjamin Vincent, IMEC, Belgium;
Federica Gencarelli, IMEC, Belgium;
Roger Loo, IMEC, Belgium;
Marc Heyns, imec
