954
Effect of Pressure on InAlN Films Grown by MOCVD for HEMT Application

Tuesday, May 14, 2013
Osgoode Ballroom, Lower Concourse Level (Sheraton)
Wei-Ching Huang , National Chiao Tung University
Kusan-Shin Liu , National Chiao Tung University
Yuen-Yee Wong , National Chiao Tung University
Chi-Feng Hsieh , National Chiao Tung University
Edward Yi Chang, PhD , National Chiao Tung University, Hsinchu, Taiwan

Abstract:

  • E9-0954 (1635.0KB) - Abstract Text
See more of: E9 - Poster Session
See more of: E9: Wide-Bandgap Semiconductor Materials and Devices 14
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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