912
Changes in the Electrochemical Behavior of Silicon after Platinum Deposition and Ionic Bombardment

Wednesday, May 15, 2013: 16:20
Essex Ballroom, Mezzanine Level (Sheraton)
Antoine Hervier , Institut Lavoisier de Versailles, Versailles, France
Damien Aureau , University of Versailles UMR 8180-Institut Lavoisier de Versailles (78000) France, Versailles, France
Arnaud Etcheberry , Institut Lavoisier de Versailles

Abstract:

  • E7-0912 (836.4KB) - Abstract Text
See more of: Electrodeposition and Semiconductor Metallization
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