Electrodeposition and Semiconductor Metallization

Wednesday, May 15, 2013: 16:20-17:40
Essex Ballroom, Mezzanine Level (Sheraton)
16:20
912
Changes in the Electrochemical Behavior of Silicon after Platinum Deposition and Ionic Bombardment
Antoine Hervier, Institut Lavoisier de Versailles; Damien Aureau, University of Versailles UMR 8180-Institut Lavoisier de Versailles (78000) France; Arnaud Etcheberry, Institut Lavoisier de Versailles
16:40
913
Preliminary Investigations of Ta Surface Chemistry in Aqueous Solutions of TeO2, and the Possible Formation of TaTe2
Chu F. Tsang, University of Georgia; Youn-Geun Kim, University of Georgia; Daniel Gebregziabiher, University of Georgia; John L. Stickney, University of Georgia
17:00
914
Electroless Nickel Nucleation on Textured Silicon Substrate
Hanane EL Belghiti, OMG Ultra Pure Chemicals; Marthe Ndjeri, Institut Lavoisier de Versailles, Versailles, France; Damien Aureau, University of Versailles UMR 8180-Institut Lavoisier de Versailles (78000) France; Muriel Bouttemy, Institut Lavoisier de Versailles; Elise Delbos, OMG Ultra Pure Chemicals; Arnaud Etcheberry, Institut Lavoisier de Versailles
17:20
915
The Nanoporous Metallization of Polymer Membranes through Photocatalytically Initiated Electroless Deposition
Michael A Bromley, Lancaster University; Colin Boxall, Lancaster University
See more of: E7: Symposium on Processes at the Semiconductor Solution Interface 5
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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